From matrix-level elements to ultratraces
The system covers more than 12 orders of magnitude on a single platform, with automatic switching between detection modes.
High Resolution Thermo Scientific · GD-MS
ELEMENT GD Plus: traces and ultratraces directly on the solid
Direct multielement analysis of high purity solid materials with high mass resolution, wide dynamic range and throughput for routine and research.
THERMO SCIENTIFIC
Analytical differences
Sensitivity and selectivity without dissolving the solid
The platform is designed for advanced and high purity materials that require very low detection limits, large dynamic range and multi-element results.
High mass resolution
Three fixed resolutions allow separating spectral interferences and confirming results in complex matrices.
Direct analysis of the solid
Reduces dissolution steps, dilution and damp laboratory infrastructure for compatible samples.
Sub-ppb detection limits
The catalogue places robust limits in the sub-ppb range for suitable applications and high purity materials.
High throughput
Fast-flow source, quick sample change and short pumping times allow up to five samples per hour.
Bulk analysis and depth profiling
The same architecture meets material composition and elemental depth profiling.
R 10.000Increased fixed resolution
13 ordersLinear dynamic range
up to 5/hthroughput indicated
From solid to result
Direct analysis of high-purity materials
The flow reduces chemical preparation and connects source, high resolution separation and automatic detection in a multi-element analysis.
01
Prepare the sample geometry
Flat samples, pins or pressed powders are accommodated with the appropriate cell and support.
02
Pre-sputtering
The high power mode removes the initial surface and stabilizes the analyzed region.
03
Separate ions
Magnetic sector and electrostatic analyzer work in modes R 300, 4,000 or 10,000.
04
Quantify
Automatic detection covers matrix, smaller, trace and Ultratrace analysis; the method can use standard RSFs or calibration.
Applications
Purity and critical impurities in technological materials
The GD Plus ELEMENT is focused on solids in which small concentrations affect performance, safety, manufacture or certification.
Aerospace
Nickel superalloys, smaller elements and trace, coatings and diffusion layers.
Semiconductors
Wafers and powders of silicon carbide, silicon and materials related to electronic manufacture.
Microelectronics
Copper, alumina powder, sputtering targets and high purity materials.
Renewable energy
Silicon blocks, wafers, solar cells and impurity control in raw materials.
Nuclear sector
Purity of graphite and depth profiling for screening and characterization of solids.
Low melting point metals
Dedicated flows for metals such as indium and gallium, including optional Peltier cooling.
High purity metals
Determination of contaminants in metals, alloys and high purity raw materials.
Advanced materials
Research, development, qualification and investigation of failures in technological solids.
Architecture and performance
Grimm source, double sector and three detectors
The combination prioritizes ion transmission, stability, separation of interference and a broad dynamic range in routine.
See full catalogueIon SourceGrimm type font with fast-flow, pulsed mode, high sputtering rate and even crater.
Mass resolutionFixed modes R = 300, 4,000 and 10,000; exchange of resolution in less than 1 s.
AnalyzersMagnetic sector and electrostatic analyzer with ion transfer optics.
DetectionSecondary electron multiplier in count and analog mode, plus Faraday detector.
Dynamic range13 linear orders, of less than 0,2 cps to more than 1012 cps.
throughputUp to 5 samples/h; sample change in less than 1 min and pumping turnaround below 10 min.
Sample formatsFlat samples, pressed powders and pins with appropriate supports and cells.
OptionsPeltier cooling for gallium and CNO option for sub-ppm limits of carbon, nitrogen and oxygen.
Brief data from the official catalogue Thermo Scientific. Limits of detection, precision and throughput vary with element, matrix, geometry, method and configuration.
Solution framework
Before setting the configuration
The matrix, geometry, expected concentration and desired type of information determine the required method and accessories.
Technical indications
✓The high purity solid needs to be analyzed directly.
✓Trace and ultratrace elements are critical to quality.
✓Interferences require high mass resolution.
✓The application requires bulk analysis and/or elemental depth profiling.
The configuration should consider...
→Conductivity, shape, dimensions and material availability.
→Target elements, expected purity and detection limits required.
→Use of flat sample, pin, pressed powder or secondary electrode.
→Need for CNO options, Peltier cooling or advanced depth profiling.
Technical equipment
ELEMENT GD Plus Catalogue
Official file embedded in this page. The download works without opening external servers.
ELEMENT GD Plus · Glow Discharge Mass Spectrometer
Official technical catalogue Thermo Scientific with source, analyzers, detectors, throughput, performance and applications.
Frequently Asked Questions
The essentials about ELEMENT GD Plus
Information for initial application evaluation.
Does ELEMENT GD Plus require sample dissolution?
Not for compatible solids. The analysis is direct, reducing dissolution steps, dilution and the risk of contamination associated with wet preparation.
What mass resolutions are available?
The system operates in three fixed modes: R = 300, 4,000 and 10,000, with an exchange of resolution in less than a second.
Can non-conductive materials be analyzed?
Many non-conductive materials can be analyzed by secondary electrode techniques. The viability depends on the sample, geometry and method.
Which sample formats are accepted?
The cell can work with flat samples and, with appropriate supports, pressed powders and pins. The dimensional evaluation must be done before the configuration.
Is the analysis destructive?
Yes. Sputtering forms a crater located in the region exposed to discharge.
How are C, N and O quantified at low levels?
The CNO option cleans the input discharge gas and was developed to achieve sub-ppm limits for carbon, nitrogen and oxygen in appropriate applications.
Set the route for purity, traces and ultratraces in your solid.
Send SENS the matrix, sample format, critical elements and desired detection limits.